82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

This etching chemical is a liquid photo-positive resist designed for use in PCB production. Made from a composition of Novolack and O-Naphto-Chinon-Diazide, it effectively transfers patterns onto various substrates. The sensitive formulation allows for high precision in chemical etching processes, ensuring that electrical circuits remain intact after application.

• Resists strong acidic etching while allowing easy removal
• Maximum photo-sensitivity in the UV-A wavelength range
• Designed for application in dark or yellow light settings
• Suitable for both metal and glass lithographic projects
• Ensures accurate pattern transfer on circuit boards
• Enables effective etching of copper and brass materials

• Utilised for printed circuit board production
• Applied in photo-lithographic processes on metals
• Suitable for glass etching
• Used in creating durable inscriptions or graphics

Surfaces must be cleaned of grease and oxides, ideally using a water-based cleaning process, with final rinses in deionised water to ensure full wettability.

Post-coating, boards should be dried in the dark, with temperatures gradually raised to 70°C and maintained for 15 minutes to ensure optimal film quality.

The exposed plate should be immersed in a sodium hydroxide bath for approximately 60 seconds to dissolve the exposed lacquer, followed by thorough rinsing in water.